Structure and Properties of Tantalum Coatings Obtained by Electron Beam Technology on Aluminum Substrates

The paper deals with the study of the structure and properties of tantalum coatings formed by electron beam evaporation and deposition of tantalum powder on 300-450 degrees C aluminum substrate. The research results of surface morphology, phase and elemental composition show that high activity of an aluminum substrate and specific conditions for vapor-phase technology promote formation of tantalum coatings characterized by a high degree of crystalline grains, with high adhesion and hardness despite the surface cracks. It was observed that the optimum deposition temperature of tantalum on aluminum substrates varies from 300 degrees C to 350 degrees C. These coatings demonstrate excellent physical and mechanical properties due to formation of intermetallic phases in the reactive zone.