RF Power Performance of Sc(Al,Ga)N/GaN HEMTs at Ka-Band

IEEE Electron Device Letters(2020)

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摘要
We report the RF power results of Sc(Al,Ga)N/GaN high electron mobility transistors (HEMTs). We show dc, small-signal RF and load-pull performance at 30 GHz with two barrier alloys—a ternary of ScAlN and a quaternary of ScAlGaN. The active layers are grown by molecular beam epitaxy on a GaN-on-SiC template. The Sc(Al,Ga)N HEMTs with 120 nm gate length achieve transconductance >700 mS/mm and >70 GHz cutoff frequency. The quaternary ScAlGaN sample shows reduced current collapse during pulsed I-V and load-pull characterization. The ScAlGaN HEMT delivers 5.77 W/mm output power ( ${V}_{D}= {20}$ V) and 47% power-added efficiency ( ${V}_{D}= {15}$ V) when tuned for maximum power and efficiency, respectively.
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关键词
ScAlN,ScAlGaN,GaN,radio frequency,dispersion,small-signal,large-signal,HEMT
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