Improvements to a mm-Wave GaN MMIC Process with Comprehensive and Efficient Process Control Monitoring

As industrial demand grows for high frequency GaN MMICs, a greater emphasis should be placed on maintaining and improving quality along with the higher throughput. A necessary component to maintaining and improving quality with higher throughput is welldesigned comprehensive process control monitoring of appropriate key performance parameters for efficient analysis of growing data sets. HRL has utilized a centralized PCM database and web-based visualization to improve designs with feedback, verify process control, improve performance through process technology comparison and resolve problems. This scalable process control monitoring approach is a part of the overall quality-control of HRL GaN MMICs as volume increases to meet growing demands.