Photomask Fabrication : Designing of Test Structure

Fabrication has now become an inevitable part of manufacturing industry. Ranging from the simple power supply to complex, layered designs, fabrication is widely accepted and implemented on a very scale level. With current existing technologies, it is practically possible to fabricate chips with numerous methodologies. Depending on the requirements, one could opt any of the existing processes of fabrication. This paper deals with one such recent and efficient fabrication methodology usually termed as “Photomask Fabrication.” The paper shall discuss the designing of test structures for fabrication which involves the implementation of photomasks. The paper shall discuss the various intermediate steps and sub-processes involved in designing and implementation of photomasks. For highlighting the results, three broad and essential devices opt as follows: MEMS Devices, SAW Devices and PHOTONIC Devices and this involves the implementation of the widely used drawing package tool of AutoCAD for designing of the test designs. Therefore, the paper implements and compare the test structures for the photomask fabrication for the abovementioned structures via the AutoCAD designing