D ec 2 01 5 Ge clusters and wetting layers forming from granular films on the Si ( 001 ) surface

The report studies transformation of a Ge granular film deposited at room temperature on the Si(001) surface to the Ge/Si(001) heterostructure as a result of rapid heating and annealing at 600°C. As a result of the short-term annealing at 600°C in conditions of a closed system, the Ge granular film transforms to the usual wetting layer and Ge clusters with multimodal size distribution and the Ge oval drops having the highest number density. After the long-term thermal treatment of the Ge film at the same temperature, Ge drops disappear; the large clusters increase their sizes at the expense of the smaller ones. The total density of Ge clusters on the surface drastically decreases. The wetting layer mixed c(4 × 2) + p(2 × 2) reconstruction transforms to the single c(4×2) one which is likely thermodynamically favoured. Pyramids or domes are not observed on the surface after any annealing.