On-Wafer FinFET-Based EUV/eBeam Detector Arrays for Advanced Lithography Processes

Chien-Ping Wang,Yi-Pei Tsai,Burn Jeng Lin,Zheng-Yong Liang,Po-Wen Chiu,Jiaw-Ren Shih, Chrong Jung Lin,Ya-Chin King

IEEE Transactions on Electron Devices（2020）

引用 3|浏览18

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摘要

A novel microdetector array (MDA) for monitoring electron beam (eBeam) and extreme ultraviolet (EUV) lithography processes in 5 nm and beyond FinFET technology is first-time presented. This on-wafer detector array consists of high-density sensing cells which are fully compatible with standard FinFET CMOS processes. Fin coupling structures and energy-sensing pads are first applied in an ultrasmall ...

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关键词

Lithography,Detectors,FinFETs,Ultraviolet sources,Logic gates

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