14-nm FinFET Technology for Analog and RF Applications

IEEE Transactions on Electron Devices(2018)

引用 106|浏览11
暂无评分
摘要
This paper describes the features and performance of an analog and RF device technology development on a 14-nm logic FinFET platform. An optimized single-side gate contact RF device layout shows a Ft/Fmax of 314/180 GHz and 285/140 GHz for N and PFinFET device, respectively. The double-side gate contact structure with contact on either end of active gate enhances the peak Fmax performance to 227 a...
更多
查看译文
关键词
FinFETs,Logic gates,Radio frequency,Performance evaluation,Resistance,Silicon
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要