Investigation of oxide layer removal mechanism using reactive gases

KimHyun-Tae, LimJung-Soo, KimMin-Su,OhHoon-Jung, KoDae-Hong, KimGyoo-Dong, ShinWoo-Gon, ParkJin-Goo

Microelectronic Engineering（2015）

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摘要

Etch rate of SiO2 and Si3N4 as a function of NH3/NF3 ratio.Display Omitted Etch rates were estimated as a function of various factors.NF3/NH3 dry etching is strongly related to NH4F concentration.A...

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