Atomic Layer Deposition of MoSe2 Using New Selenium Precursors

Raul Zazpe,Jaroslav Charvot,Richard Krumpolec,Ludek Hromadko,David Pavliňák,Filip Dvorak,Petr Knotek,Jan Michalicka,Jan Prikryl,Siowwoon Ng,Veronika Jelínková,Filip Bureš,Jan M. Macak

FlatChem（2020）

引用 18|浏览24

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摘要

•Alkysilyl (R3Si)2Se and alkystannyl (R3Sn)2Se compounds introduced as ALD precursors.•Successful ALD of MoSe2 nanostructures on various substrates demonstrated.•Concomitant in-plane and out-of-plane MoSe2 growth of nanosheets achieved.•Presented results pave the way for ALD deposition of MoSe2 for various applications.

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关键词

2D materials,Atomic layer deposition,Chalcogens,Layered compounds,Synthesis design

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