Surfactant-Mediated Growth and Patterning of Atomically Thin Transition Metal Dichalcogenides.
Xufan Li,Ethan Kahn,Gugang Chen,Xiahan Sang,Jincheng Lei,Donata Passarello,Akinola D. Oyedele,Dante Zakhidov,Kai-Wen Chen,Yu-Xun Chen,Shang-Hsien Hsieh,Kazunori Fujisawa,Raymond R. Unocic,Kai Xiao,Alberto Salleo,Michael F. Toney,Chia-Hao Chen,Efthimios Kaxiras,Mauricio Terrones,Boris Yakobson,Avetik R. Harutyunyan ACS Nano（2020）
关键词
surfactant,MoS2,edge passivation,strain,lithography-free patterning
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