GaN HEMTs on Si with Regrown Contacts and Cutoff/Maximum Oscillation Frequencies of 250/204 GHz

IEEE Electron Device Letters(2020)

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摘要
This work demonstrates the high-frequency and high-power performance capacity of GaN high electron mobility transistors (HEMTs) on Si substrates. Using a T-gate and n++-GaN source/drain contacts, the InAlN/GaN HEMT with a gate length of 55 nm and a source-drain spacing of 175 nm shows a maximum drain current ID,MAX of 2.8 A/mm and a peak transconductance gm of 0.66 S/mm. The same HEMT exhibits a f...
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关键词
HEMTs,MODFETs,Gallium nitride,Silicon,Logic gates,Silicon carbide,Substrates
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