Hot Carrier Degradation-Induced Dynamic Variability in FinFETs: Experiments and Modeling

IEEE Transactions on Electron Devices(2020)

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摘要
In this article, the dynamic variability induced by hot carrier degradation (HCD) in FinFETs is studied with decomposing the variation contributions of multiple types of traps. The nonlinear relationship of $\mu - \sigma ^{{2}}$ ( $\Delta {V}_{\,\text {th}}$ ) are newly observed in both n- and p-type FinFETs. A multitrap-based HCD variation model is proposed and verified in FinFETs. The impacts of HCD variations on the static random-access memory (SRAM) read/write stability are also demonstrated with the circuit simulation. The results are beneficial for the reliability-aware circuit design against HCD variability particularly for FinFET-based circuits.
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关键词
FinFETs,Degradation,Stress,Hot carriers,Stress measurement,Integrated circuit modeling,Integrated circuit reliability
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