TEMPO: Fast Mask Topography Effect Modeling with Deep Learning

Wei Ye
Wei Ye
Mohamed Baker Alawieh
Mohamed Baker Alawieh
Yuki Watanabe
Yuki Watanabe

ISPD '20: International Symposium on Physical Design Taipei Taiwan September, 2020, pp. 127-134, 2020.

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Abstract:

With the continuous shrinking of the semiconductor device dimensions, mask topography effects stand out among the major factors influencing the lithography process. Including these effects in the lithography optimization procedure has become necessary for advanced technology nodes. However, conventional rigorous simulation for mask topogr...More

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