The dependence of aluminum lattice orientation on semiconductor lattice parameter in planar InAs/Al hybrid heterostructures
Journal of Crystal Growth(2020)
摘要
•Aluminum thin films epitaxially grown on two-dimensional InAs quantum wells are characterized.•The normal orientation of aluminum film changes as the surface lattice parameter is varied.•The driving force of the aluminum orientation is analyzed.
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关键词
A1. Crystal structure,A1. Transmission electron microscopy,A1. X-ray diffraction,A3. Molecular beam epitaxy,B2. Semiconducting III–V materials
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