Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions

Vivien Cartailler,Grégory Imbert,Névine Rochat,Catherine Chaton, Du Vo-Thanh,Daniel Benoit,Geneviève Duchamp,Hélène Frémont

Thin Solid Films（2020）

引用 2|浏览20

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摘要

•Mass, stress and infrared spectroscopy monitoring yield similar diffusion coefficient.•Moisture uptake can be significant even at clean room conditions for dielectrics.•A dual stage model seems to be more adapted to model moisture diffusion.

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关键词

Moisture diffusion,Thin dielectric film,Silicon oxide,Plasma-enhanced chemical vapor deposition

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