Influence of an Annealing Temperature in a Vacuum Atmosphere on the Physical Properties of Indium Tin Oxide Nanorod Films.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY(2020)
摘要
In the present study, indium tin oxide (ITO) nanorod films were produced by usage of ion-assisted electron-beam evaporation with a glancing angle deposition technique. The as-produced ITO nanorod films were annealed in the temperature range of 100-500 degrees C for two hours in a vacuum atmosphere. The as-produced ITO nanorod films exhibited (222) and (611) preferred orientations from the X-ray diffraction pattern. After vacuum annealing at 500 degrees C, the ITO nanorod films demonstrated many preferred orientations and the improvement of film crystallinity. The sheet resistance of the as-produced ITO nanorod films was 11.92 Omega/square and was found to be 13.63 Omega/square by annealing at 500 degrees C. The as-produced and annealed ITO nanorod films had a rod diameter of around 80 nm and transmittance in a visible zone of around 90%. The root mean square roughness of the as-produced ITO nanorod film's surface was 5.49 nm, which increased to 13.77 nm at an annealing temperature of 500 degrees C. The contact angle of the as-produced ITO nanorod films was 110.9 degrees and increased to 116.5 degrees after annealing at 500 degrees C.
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关键词
ITO Nanorod Films,Vacuum Annealing,Ion-Assisted Electron-Beam Evaporation,Glancing Angle Deposition,Physical Properties
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