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Modeling and Plasma Characteristics of High-Power Direct Current Discharge

Lei Chen,Suihan Cui,Wei Tang,Lin Zhou,Tijun Li,Liangliang Liu,Xiaokai An,Zhongcan Wu,Zhengyong Ma,Hai Lin,Xiubo Tian,Ricky Ky Fu,Paul K. Chu,Zhongzhen Wu

Plasma Sources Science and Technology（2020）

Cited 23|Views51
Key words
thermal accumulation,sputtering-HPMS,ionization rate,deposition rate
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