Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition

Yūki Katamune,Hiroto Mori, Fumihiro Morishita,Akira Izumi

Thin Solid Films（2020）

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摘要

•Silicon carbon nitride (SiCN) films were synthesized from hexamethyldisilazane.•C and N contents of SiCN films are controllable with NH3/H2 flow rate ratios.•Film homogeneity was improved by introducing NH3 during film deposition.•Hardness and elastic modulus of SiCN films decreased with increasing N contents.

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关键词

Silicon carbon nitride,Hot-wire chemical vapor deposition,X-ray photoelectron spectroscopy,Fourier transform infrared spectroscopy,Mechanical properties

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