Characterization of Nanostructured TiC Thin FilmsSynthesized by TVA (Thermionic Vacuum Arc) Method

Nanocrystalline titanium carbide (TiC) thin films were prepared by an original method based on Thermoionic Vacuum Arc (TVA) plasma. Characterization of the obtained titanium carbide thin films has been made by Transmission Electron Microscope (TEM) with high resolution (1,4 A) and Atomic Force Microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films with peak to valley roughness in the range of 31-38 nm.