Deposition of thin films containing carboxylic acid groups on polyurethane foams by atmospheric pressure non-equilibrium plasma jet
Surface and Coatings Technology（2019）
摘要
Thin films containing carboxylic acid groups are deposited on open-cell polyurethane (PU) foams by using an atmospheric pressure non-equilibrium plasma jet, in dielectric barrier discharge configuration, fed with helium, acrylic acid and ethylene.
更多查看译文
关键词
Atmospheric pressure plasma jet,Thin film deposition,Acrylic acid,Open-cell foam,3D porous material
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要