Predicting Yield of Photonic Circuits With Wafer-scale Fabrication Variability: Invited Paper

Wim Bogaerts,Yufei Xing,Yinghao Ye,Umar Khan,Jiaxing Dong, Joris Geessels,Martin Fiers,Domenico Spina,Tom Dhaene

2019 IEEE MTT-S International Conference on Numerical Electromagnetic and Multiphysics Modeling and Optimization (NEMO)（2019）

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摘要

We present a workflow for variability analysis and yield prediction of photonic integrated circuits affected by fabrication variations. The technique combines synthetic wafer maps with layout-aware Monte-Carlo simulations. We demonstrate this on different layout configurations of linewidth-tolerant Mach-Zehnder interferometers.

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关键词

linewidth-tolerant Mach-Zehnder interferometers,wafer-scale fabrication variability analysis,photonic integrated circuits,layout-aware Monte-Carlo simulations,synthetic wafer maps

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