InAs/GaSb Core-Shell Nanowires: Growth and Characterization

2019 Compound Semiconductor Week (CSW)(2019)

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摘要
We present results about the growth, structural properties and electrical transport of InAs/GaSb core-shell nanowires. The nanowire are grown self-seeded and selectively by molecular beam epitaxy on patterned SiO 2 /Si(111) substrates. The two combined materials are almost lattice matched resulting in coherent epitaxial growth, which is demonstrated by high resolution transmission electron microscopy measurements. Multi-terminal devices contacting both the core and shell are processed using selective wet chemical etching and electron beam lithography. The broken-gap heterointerface of InAs and GaSb are reflected in the DC electrical measurements which are discussed with the help of simulation results of the band structure and carrier concentrations.
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high resolution transmission electron microscopy,InAs-GaSb core-shell nanowires,SiO2-Si(111) substrates,broken-gap heterointerface,DC electrical measurements,band structure,carrier concentrations,electron beam lithography,selective wet chemical etching,coherent epitaxial growth,molecular beam epitaxy,electrical transport,structural properties,InAs-GaSb,SiO2-Si
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