Criticality of Photo Track Monitoring for Lithography Defect Control
2019 30TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC)（2019）
Key words
lithography scanner,photo track monitoring,lithography defect control,semiconductor industry,integrated circuit design,self-aligned double patterning,self-aligned quadruple patternin,lithography photo track monitoring,deep ultraviolet laser-based inspection platform,high numerical aperture,normal illumination,defect review scanning electron microscope,automatic defect classification,statistical process control charts,immersion hood assembly,lithography track,production wafers,PTM qualification process,tool health monitoring,lithography excursion monitoring,PTM failure,product wafers,PTM detection method,SPC methodologies
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