Design Of Microbolometer By Polycrystalline Silicon In Standard Cmos Technology

Xinwen Cao,Mingcheng Luo, Wei Si,Feng Yan,Xiaoli Ji

2019 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC)(2019)

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摘要
Polycrystalline silicon films are widely used as sensor material in CMOS detectors. In this paper, we designed an air-bridge microbolometer in standard CMOS technology with Polycrystalline silicon multilayer sandwich structures. The device performance was then estimated under the optical and thermal simulators. it is found that the voltage responsivity and noise equivalent power of device is 4.6 KV/W and 1nW respectively. The proposed detector with high performance can be integrated in IC process to fabricate microbolometer arrays.
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关键词
device performance,optical simulators,thermal simulators,voltage responsivity,standard CMOS technology,Polycrystalline silicon films,sensor material,CMOS detectors,Polycrystalline silicon multilayer sandwich structures,microbolometer array fabrication,air-bridge microbolometer design,IC process,power 1.0 nW,Si
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