Electrostatic Coupling and Identification of Single-Defects in GaN/AlGaN Fin-MIS-HEMTs

Solid-State Electronics(2019)

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摘要
•Charge trapping effects are considered as one of the most severe reliability issues in GaN/AlGaNMIS-HEMTs.•Thus, the identification of the origin and the physical properties of active defects is one of the key factors to improve the stability of GaN technology.•In this work, we suggest two neighboring nitrogen vacancies as the origin of correlated random telegraph noise (RTN) emissions in a GaN/AlGaN fin-MIS-HEMT.•Electrostatic coupling between these two defects is calculated using three different approaches and the results are verified using a Hidden Markov Model (HMM).
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