Study of Implantation Defects in CVD Graphene by Optical and Electrical Methods

A Chemical Vapor Deposition graphene monolayer grown on 6H-SiC (0001) substrates was used for implantation experiments. The graphene samples were irradiated by He+ and N+ ions. The Raman spectra and electrical transport parameters were measured as a function of increasing implantation fluence. The defect concentration was determined from intensity ratio of the Raman D and G peaks, while the carrier's concentration was determined from the relations between G and 2D Raman modes energies. It was found that the number of defects generated by one ion is 0.0025 and 0.045 and the mean defect radius about 1.5 and 1.34 nm for He+ and N+, respectively. Hole concentration and mobility were determined from van der Pauw measurements. It was found that mobility decreases nearly by three orders of magnitude with increase of defect concentration. The inverse of mobility versus defect concentration is a linear function, which indicates that the main scattering mechanism is related to defects generated by ion implantation. The slope of inverse mobility versus defect concentration provides the value of defect radius responsible for scattering carriers at about 0.75 nm. This estimated defect radius indicates that the scattering centres most likely consist of reconstructed divacancies or larger vacancy complexes.