Ultra-Low Power 3D NC-FinFET-based Monolithic 3D+ -IC with Computing-in-Memory for Intelligent IoT Devices

2018 IEEE International Electron Devices Meeting (IEDM)(2018)

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摘要
For the first time, ultra-low power ferroelectric FinFET-based monolithic 3D + -IC technology was demonstrated for near memory computing (NMC) circuit. Key enablers are ICP-SiO 2 interfacial layer, doped hafnia ferroelectric gate dielectric layer (HfZrO 2 ), and far-infrared laser activation. The proposed stackable 3D NC-FinFETs thus fabricated exhibit record-low sub-threshold swing (NC-nFinFET: 45mV/dec and NC-pFinFET: 50mV/dec) and high I on /I off (>10 6 ) that enable ultra-low power operation (VDD=100mV) of CMOS inverter and SRAM. Moreover, above mentioned features of NC-FinFETs and the differential output of SRAM readout enable 50+% area reduction in the near-memory computing circuitry.
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关键词
doped hafnia ferroelectric gate dielectric layer,stackable 3D,NC-nFinFET,NC-pFinFET,ultra-low power operation,near-memory computing circuitry,computing-in-memory,intelligent IoT devices,IC technology,interfacial layer,ultra-low power ferroelectric FinFET,ultra-low power 3D NC-FinFET,record-low sub-threshold swing,far-infrared laser activation,monolithic 3D+-IC,CMOS inverter,SRAM readout,voltage 100.0 mV,HfZrO2,SiO2
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