Polycrystalline silicon wafer defect segmentation based on deep convolutional neural networks

Pattern Recognition Letters(2020)

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摘要
•A novel polycrystalline silicon wafer defect segmentation method based on CNNs is proposed.•The proposed method alleviates unbalanced pixel distribution by adopting region proposal network.•The experimental results on real defect images show that the proposed methods outperforms state-of-the-art methods.
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关键词
Polycrystalline silicon wafer,RPN,Defects segmentation,CNN
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