Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS(2018)

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摘要
This guest editorial summarizes the Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects
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