Statistical Variability Simulation Of Novel Capacitor-Less Z2fet Dram: From Transistor To Circuit
2018 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES (SISPAD 2018)(2018)
Key words
circuit level read performance,metal gate granularity,statistical variability simulation,capacitor-less Z2FET DRAM,random discrete dopant induced variations,fabrication process,external capacitor,Z2FET-based volatile memory product development,Z2FET-based memory cell,process optimization,Gated-SOI region,DRAM Memory Window
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