Large Area Nanostructure Integration For Broad-Spectrum, Omnidirectional Antireflection Improvements On Polymer Packaged, Mechanically Flexible, Epitaxial Lift-Off Iii-V Solar Arrays

We demonstrate the integration of subwavelength moth-eye antireflection nanostructures onto a fully packaged commercial eight cell array of dual junction epitaxial lift-off GaAs solar cells. A low cost, scalable, and large area nanosphere lithography patterning process was used to fabricate the nanostructures on a polymer PET packaging layer. The mechanically flexible array shows 29.80% PCE at normal incidence and enhanced J(sc) at large angles of incidence due to the anti-reflection nanostructures.