Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation
Surface and Coatings Technology(2018)
摘要
To withstand oxidation at a temperature ≥ 850 °C, an optimized Ti1−xAlxN coating was grown via reactive High Power Impulse Magnetron Sputtering (HiPIMS) technology on three identical Ti0.48Al0.48Cr0.02Nb0.02 billets. Different substrate surface pre-treatments were designed to increase performance: i) mechanical polishing, ii) mechanical polishing combined with a strong plasma etching, and iii) mechanical polishing coupled to both a weak plasma etching and a Ti1−yAly metallic interlayer deposition. Then, all the specimens were cyclically heat treated up to 200 cycles at 950 °C, using a Burner Rig (BR) facility.
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关键词
Film-substrate interface design,Reactive HiPIMS,TiAlN coatings oxidation resistance,γ-TiAl based alloys,Residual stress,Burner-rig thermal test
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