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New Developments in CVD Diamond for Detector Applications

W. Adam,E. Berdermann,P. Bergonzo,W. de Boer,F. Bogani,E. Borchi,A. Brambilla,M. Bruzzi,C. Colledani,J. Conway,P. D’Angelo,W. Dabrowski,P. Delpierre,W. Dulinski,J. Doroshenko,B. van Eijk,A. Fallou,P. Fischer,F. Fizzotti,C. Furetta,K.K. Gan,N. Ghodbane,E. Grigoriev,G. Hallewell,S. Han,F. Hartjes,J. Hrubec,D. Husson,H. Kagan,J. Kaplon,R. Kass,M. Keil,K.T. Knoepfle,T. Koeth,M. Krammer,A. Logiudice, R. Lu,L. Mac Lynne,C. Manfredotti,D. Meier,D. Menichelli,S. Meuser,M. Mishina,L. Moroni,J. Noomen, A. Oh,M. Pernicka,L. Perera,R. Potenza,J.L. Riester,S. Roe,A. Rudge,S. Sala,M. Sampietro,S. Schnetzer,S. Sciortino,H. Stelzer, R. Stone,C. Sutera,W. Trischuk,D. Tromson,C. Tuve,B. Vincenzo,P. Weilhammer,N. Wermes,M. Wetstein,W. Zeuner,M. Zoeller

The European Physical Journal C（2004）

引用 12|浏览10
关键词
Chemical Vapor Deposition,Vapor Deposition,Chemical Vapor,Recent Result,Interaction Region
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