The influence of tertiary butyl hydrazine as a co-reactant on the atomic layer deposition of silver

•We demonstrate metallic silver growth by direct liquid injection thermal ALD.•A substituted hydrazine is used as a powerful reducing agent for the first time.•The hydrazine extends the ALD temperature window compared with alcohol.•Hydrazine promotes a more planar growth mode compared to alcohol.•Film adhesion is improved using hydrazine compared with alcohol.