Self-Aligned Double Patterning Lithography Aware Detailed Routing With Color Preassignment.
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems(2017)
摘要
As the technology nodes scale down to sub-22 nm, double patterning lithography has been considered as a practical solution for layout manufacturing. Compared with litho-etch-litho-etch, self-aligned double patterning (SADP) has better overlay control. To have a better SADP layout decomposability of routing patterns, we consider SADP during detailed routing stage. Two major types of SADP processes ...
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关键词
Layout,Routing,Color,Lithography,Metals,Runtime
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