Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

Igor Alexandrovich Makhotkin,Igor Milov,J. Chalupský,Kai Tiedtke,Hartmut Enkisch,Gosse Charles De Vries,Frank Scholze,Frank Siewert,Jacobus Marinus Sturm,Konstantin Nikolaev,Robbert Wilhelmus Elisabeth van de Kruijs, M.A. Smithers, Henk A. G. M. van Wolferen, Enrico G. Keim,Eric Louis,Iwanna Jacyna,M. Jurek,D. Klinger,J.B. Pełka,L. Juha,V. Hajkova,Vojtěch Vozda,T. Burian,Karel Saksl,Bart Faatz,Barbara Keitel,Elke Plönjes,Siegfried Schreiber,Sven Toleikis, R.A. Loch,Martin Hermann,Sebastian Strobel, Rilpho Donker,Tobias Mey,R. Sobierajski

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS（2018）

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摘要

The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg (FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shot damage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditions justifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible for multi-shot damage in optical coatings. (C) 2018 Optical Society of America.

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