Enhanced capacitive property of HfN film electrode by plasma etching for supercapacitors

Zecui Gao,Zhengtao Wu,Shengsheng Zhao,Tengfei Zhang,Qimin Wang

Materials Letters（2019）

引用 39|浏览13

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摘要

HfN films with high conductivity were deposited by reactive DC magnetron sputtering, followed by plasma etching. The plasma etching treatment significantly changed the surface morphology and enhanced specific capacitance of the HfN films.

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关键词

HfN thin films,Physical vapour deposition,Plasma etching,Supercapacitor,Electrochemical properties

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