Formation Of Highly Textured Zn0.2ni0.8mn2o4 Thin Films By Rf Magnetron Sputtering

Mengxiao Ji,Wei Ren,Lu Li,Yonggang Wang,Xiaobo Zhang,Qing Zhou,Jian Hu,Chunqi Jiang

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY（2018）

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摘要

Highly textured Zn0.2Ni0.8Mn2O4 (ZNM) thin films were prepared on Si(100) substrates through RF magnetron sputtering under different annealing temperatures. The effects of annealing temperature on the microstructure and electrical properties of ZNM thin films were investigated. The mechanism of highly textured ZNM spinel film formation was discussed. (C) 2018 The Electrochemical Society.

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