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Process Challenges in Fully Aligned Via Integration for Sub 32 Nm Pitch BEOL

Benjamin D. Briggs,C. B. Peethala,D. L. Rath,J. Lee,S. Nguyen,N. V. LiCausi,P. S. McLaughlin,H. You,D. Sil,N. A. Lanzillo,H. Huang,R. Patlolla,T. J. R. Haigh,Y. Xu,C. Park,P. Kerber,H. K. Shobha,Y. Kim,J. Demarest,J. Li,G. Lian,M. Ali,C. T. Le,E. T. Ryan,L. A. Clevenger,D. F. Canaperi,T. E. Standaert,G. Bonilla,E. Huang

2018 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE (IITC)（2018）

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