Effects of CF4 Surface Etching on 4H-SiC MOS CapacitorsKiichi Kobayakawa,Kosuke Muraoka,Hiroshi Sezaki,Seiji Ishikawa,Tomonori Maeda,Shin Ichiro KurokiMaterials Science Forum(2018)引用 1|浏览4暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要