Study of TiN Gate SOI-CMOS process shrink by minimal fabKazuhiro Koga,Yongxun Liu,Fumito Imura, Masashi Kase,Shuichi Noda, Kazumasa Nemoto,Sommawan Khumpuang,Shiro HaraThe Japan Society of Applied Physics（2021）引用 23|浏览18暂无评分关键词soi-cmos soi-cmos process,tin,minimal fabAI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
