Improved Subthreshold Swing and Short Channel Effect in FDSOI n-Channel Negative Capacitance Field Effect Transistors

IEEE Electron Device Letters(2018)

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摘要
Negative capacitance (NC) FETs with channel lengths from 30 nm to 50 μm, gated with ferroelectric hafnium zirconium oxide are fabricated on fully depleted silicon-on-insulator (FDSOI) substrates. Enhanced capacitance due to NC, hysteresis-free operation, and improved subthreshold slope are observed. The NC effect leads to enhancement of drain current for small voltage operation. In addition, impro...
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关键词
Capacitance,Logic gates,Silicon-on-insulator,Field effect transistors,Hysteresis,Performance evaluation
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