Improved Subthreshold Swing and Short Channel Effect in FDSOI n-Channel Negative Capacitance Field Effect Transistors
IEEE Electron Device Letters(2018)
摘要
Negative capacitance (NC) FETs with channel lengths from 30 nm to 50 μm, gated with ferroelectric hafnium zirconium oxide are fabricated on fully depleted silicon-on-insulator (FDSOI) substrates. Enhanced capacitance due to NC, hysteresis-free operation, and improved subthreshold slope are observed. The NC effect leads to enhancement of drain current for small voltage operation. In addition, impro...
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关键词
Capacitance,Logic gates,Silicon-on-insulator,Field effect transistors,Hysteresis,Performance evaluation
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