UV-light assisted patterned metallization of textile fabrics

A UV-assisted process allows full-faced or local deposition of silver domains on textiles made of natural as well as synthetic fibers, which act as nuclei for subsequent galvanic metallization. SEM and XPS analyses indicate that the process generates particulate depositions - particles, aggregates - of elementary silver. Masking the UV irradiation confines silver deposition strictly to the exposed areas thus allowing patterning. Adhesion of the deposited silver is high on the studied natural fiber cotton and polyamide fibers. Adhesion on smooth and chemically inert synthethic fibers such as, e.g., poly(ethylene terephthalate) or para- and meta-aramids could be enhanced by finishing with poly(vinylamine) thus providing complex-forming amino groups. Although the process does not deposit a closed, electrically conducting layer, all studied samples could be metallized by galvanization. The resulting metal coatings exhibit high conductivity and wash stability. Following a patterned silver deposition, the subsequent galvanic metallization produced conductive patterns of identical geometry thus opening an avenue towards printed circuits on textile fabrics. (C) 2017 Elsevier B.V. All rights reserved.