The effects of thickness on magnetic properties of FeCuNbSiB sputtered thin films
SCIENTIA IRANICA(2017)
摘要
Thin films of FC73.1 Li3.1Si14.7B8.2 al 200, 500, and 800 nm thicknesses have been deposited by HI spill cling. Their rnagxietic properties have been cllaracterized using Alternating Gradient Field AIagr let orneter (AGFM) and Vibrating Sample Magnetometer (VS1A1). The effects of residual stresses investigated by nauoindentation experiments were conducted on the as -deposited samples. It is observed that the coercivity of as -deposited films is inversely proportional to the thickness in relation With the residual stress induced during sputtering. (C) 2017 Sharif Fniversity of Technology. All rights reserved.
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关键词
Magnetic properties,Thin films,Ion sputtering,Residual stresses,Nanoindentation
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