Self-assembled metal nano-multilayered film prepared by co-sputtering method

Applied Surface Science(2018)

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摘要
•The self-assembled nano-multilayered film was prepared by co-sputtering successfully.•The modulation period is about 20 nm and related to rotating speed.•The interfaces have semi-coherent even coherent relationship.•The diffusion barrier element is essential to obtain the nano-multilayered structure.
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关键词
Co-sputtering deposition,Multilayers,Self-assembly,Diffusion barrier
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