Anomalous Source-Side Degradation of InAlN/GaN HEMTs Under High-Power Electrical Stress

IEEE Transactions on Electron Devices(2017)

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摘要
The electrical degradation of InAlN/GaN high-electron-mobility transistors for millimeter-wave applications has been examined under simultaneous high VDS,stress and high IDstress electrical stress. Besides a drain current decrease and a positive threshold voltage shift, the creation of an anomalous source-side gate leakage path has been identified. We attribute this to high electric-field induced ...
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关键词
Stress,Logic gates,Degradation,HEMTs,MODFETs,Gate leakage
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