RF Performance of In Situ SiN x Gate Dielectric AlGaN/GaN MISHEMT on 6-in Silicon-on-Insulator Substrate

IEEE Transactions on Electron Devices(2017)

引用 14|浏览2
暂无评分
摘要
A high power-added efficiency and low dynamic on-resistance (RON) AlGaN/GaN metal-insulator- semiconductor high-electron mobility transistor (MISHEMT) with in situ SiNx insulator design was demonstrated on 150-mm silicon-on-insulator (SOI) substrate. Compared to traditional high-resistivity Si substrate, SiNx/AlGaN/GaN MISHEMT grown on the SOI 5-μm-thick Si active layer performed better tensile st...
更多
查看译文
关键词
Substrates,Silicon-on-insulator,Silicon,Logic gates,Aluminum gallium nitride,Wide band gap semiconductors,Leakage currents
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要