Properties of Na 0.5 Bi 0.5 TiO 3 -SrTiO 3 Ferroelectric Thin Films Prepared by a Modified MOSD Process

0.82NBT-0.18ST and 0.85NBT-0.15ST thin films have been prepared on Si substrates by a modified metalorganic solution deposition process. To achieve films with better ferroelectric properties, three main items have been changed in the process. Then the crystal structures, surface microstructures, hysteresis loops, fatigue curves and capacitance-voltage curves of the films were measured. It can be found that NBT-ST films can crystallize well after annealing at 650 °C for 5 minutes and have smooth surface microstructures. The 0.85NBT-0.15ST thin films exhibit better well-defined hysteresis loops than 0.82NBT-0.18ST, with a remnant polarization of 1.1 mC/cm 2 and a coercive fields of 44.2 kV/cm. The clockwise C-V curves show that they have a desired polarization-type switching mode. The memory window of 0.82NBT-0.18ST thin film is about 1.8V, and that of 0.85NBT-0.15ST thin film is about 2.5V.