Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography

•A new hybrid X-ray interference technology is developed for fabricating large-area high-aspect-ratio nanostructures.•The pattern area is up to square centimetres with high-aspect-ratio up to 3.•There is no special requirement for the substrate and the pattern is transferred on variable substrates successfully.