Effects of surface etching with CF 4 on 4H-SiC MOS CapacitorsKiichi Kobayakawa, Kousuke Muraoka,Hiroshi Sezaki,Seiji Ishikawa,Tomonori Maeda,Takamaro Kikkawa,Shin-Ichiro KurokiThe Japan Society of Applied Physics(2017)引用 23|浏览4暂无评分关键词h-sicAI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要